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Submitted by admin on June 23, 2011 - 3:08pm
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Found 3 results
Liu F, Li Y. 2013. Grouping design of eight-mirror projection objective for high-numerical aperture EUV lithography.. Applied optics. 52(29):7137-44.
Ma X, Song Z, Li Y, Arce GR. 2013. Block-based mask optimization for optical lithography.. Applied optics. 52(14):3351-63.